Polymeer voor bovenste anti-reflecterende deklaag, werkwijze voor het bereiden daarvan en samenstelling van een bovenste anti-reflecterende deklaag die het polymeer omvat.

摘要

A top anti-reflective coating (ARC) polymer is new. The ARC polymer has a weight-average molecular weight of 1000-1x10 6>. A top ARC polymer of formula (I) is new. The ARC polymer has a weight-average molecular weight of 1000-1x10 6>. R1-R3 : H or Me; and a-c : mole fraction of each monomer, i.e. 0.05-0.9 Independent claims are also included: (A) preparation of ARC polymer (I); (B) a top ARC composition comprising ARC polymer (I); and (C) formation of a pattern of semiconductor device by applying a photoresist to a semiconductor substrate, applying ARC composition on top of the photoresist and baking the composition to form a top anti-reflective coating, and exposing the photoresist to light and developing the exposed photoresist to form a photoresist pattern. [Image].