首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
摘要
申请公布号
JPS511548(Y1)
申请公布日期
1976.01.17
申请号
JP19700059563U
申请日期
1970.06.15
申请人
发明人
分类号
H05B3/20;F24C7/06;F24D13/02;H05B3/06;H05B3/10;H05B3/26;(IPC1-7):H05B3/10
主分类号
H05B3/20
代理机构
代理人
主权项
地址
您可能感兴趣的专利
ANOMALY DETECTION DEVICE FOR A PERMANENT MAGNET SYNCHRONOUS ELECTRIC MOTOR
METHOD, DEVICE AND SYSTEM FOR AUTOMATICALLY DISCOVERING OPTICAL FIBER CONNECTIONS WITHIN NETWORK ELEMENT
FENESTRATED PROSTHESIS
PROTEIN HAVING GLYCOALKALOID BIOSYNTHASE ACTIVITY, AND GENE ENCODING SAME
COOKER AND CONTROL METHOD THEREOF
METHOD OF PROVIDING A FLEXIBLE SEMICONDUCTOR DEVICE AT HIGH TEMPERATURES AND FLEXIBLE SEMICONDUCTOR DEVICE THEREOF
PROCESS FOR FORMULATING STABILIZER MELTS, SHAPED BODIES PRODUCED THEREBY AND USE THEREOF
HALF TONE MASK AND MANUFACTURING METHOD OF THE SAME
LED RETROFIT FOR MINIATURE BULBS
INSERTION DEVICE SYSTEMS AND METHODS
NOVELTY STORAGE CONTAINER/DISPLAY APPARATUS
Electrical Connector
MALE CONNECTOR AND CONNECTOR APPARATUS
BOARD WITH CONNECTION TERMINALS
METHOD FOR MANUFACTURING SOI SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
SILICON-SELECTIVE DRY ETCH FOR CARBON-CONTAINING FILMS
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
FinFET Formation with a Thermal Oxide Spacer Hard Mask Formed from Crystalline Silicon Layer
Solar Cell Defect Passivation Method
METHOD FOR REPROCESSING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING REPROCESSED SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SOI SUBSTRATE