发明名称 半導体装置およびその製造方法
摘要 Provided is a semiconductor device that can be manufactured at low cost and that can reduce a reverse leak current, and a manufacturing method thereof. A semiconductor device has: a source region and a drain region having a body region therebetween; a source trench that reaches the body region, penetrating the source region; a body contact region formed at the bottom of the source trench; a source electrode embedded in the source trench; and a gate electrode that faces the body region. The semiconductor device also has: an n-type region for a diode; a diode trench formed reaching the n-type region for a diode; a p+ region for a diode that forms a pn junction with the n-type region for a diode at the bottom of the diode trench; and a schottky electrode that forms a schottky junction with the n-type region for a diode at side walls of the diode trench.
申请公布号 JP6021246(B2) 申请公布日期 2016.11.09
申请号 JP20120107673 申请日期 2012.05.09
申请人 ローム株式会社 发明人 吉持 賢一
分类号 H01L27/04;H01L21/336;H01L29/78 主分类号 H01L27/04
代理机构 代理人
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