| 摘要 |
PURPOSE:To improve the durability of a shape as a whole and to simplify the process by forming a hard thin film on a base material, executing the etching processing of the hard thin film by the irradiation of a focusing ion beam and forming a pattern. CONSTITUTION:On a base material 1, a hard thin film 2 is formed. As the concrete example of a substrate material, a sintered hard alloy, the subject to harden a steel for a metallic mold such as a marageing steel, silicone and quartz are listed up. The base material 1 is mirror-ground, cleaned and used by a necessary quantity only. As the concrete example of the material of the hard thin film 2, TiN, etc., are listed up. Next, in a focusing ion beam device equipped with a stage to be able to control a moving range with a high accuracy, the base material 1, in which the hard thin film 2 is formed, is put, a focusing ion beam is used, the hard thin film 2 is etched and a master disk for information recording medium having a desired pattern is obtained. Since the base material with a high hardness and strength and the hard thin film are used, the durability is improved.
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