| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for film formation, which has a high refractive index, achieves high transparency, high heat resistance, high light fastness and high hardness, and is suitable for producing a film for a display device.SOLUTION: The composition for film formation comprises: a silicon compound (A) having a weight average molecular weight of 1000 to 20000, obtained by hydrolyzing and condensing a hydrolyzable silane in a non-alcohol solvent; inorganic particles (B) having an average particle diameter of 1 to 100 nm and a refractive index of 1.50 to 2.70; and a solvent (C). The silicon compound (A) is a hydrolyzed condensate of a compound of formula (1), where Rrepresents an alkoxy group, an acyloxy group or a halogen group. The non-alcohol solvent is a ketone or ether. The inorganic particles (B) are zirconia or rutile titania. A pattern forming method is provided, which includes applying a photosensitive resist on the composition for film formation, drying the resist, irradiating the resist with light, developing and peeling the resist.SELECTED DRAWING: Figure 1 |
