| 摘要 |
PURPOSE: To provide a technique for measuring a time-dependent drift amount within a minimum deflection region in multistage deflection.CONSTITUTION: A measuring method for a beam drift amount includes the steps of: exposing a dummy pattern in a size smaller than a resolution limit of a resist while using a charged particle beam on a specimen to which the resist is applied in such a manner that a reference position is located within a minimum deflection region among a plurality of deflection regions in different sizes; exposing an evaluation pattern in a size equal to or larger than the resolution limit of the resist while using a charged particle beam on such a specimen to which the resist is applied, at a position different from the dummy pattern in such a manner that the reference position is located within the minimum deflection region after the lapse of a preset time from the exposure of the dummy pattern; measuring a position of the exposed evaluation pattern; calculating a positional displacement amount of a measured position of the evaluation pattern from a designed position of the evaluation pattern; and outputting the calculated positional displacement amount.SELECTED DRAWING: Figure 3 |
