| 发明名称 |
THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS |
| 摘要 |
Provided are ionic thermal acid generators comprising an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group and a cation. Also provided are photoresist pattern trimming compositions that include an ionic thermal acid generator, a matrix polymer and a solvent, and methods of trimming a photoresist pattern using the trimming compositions. The thermal acid generators, compositions and methods find particular applicability in the manufacture of semiconductor devices. |
| 申请公布号 |
US2017123314(A1) |
申请公布日期 |
2017.05.04 |
| 申请号 |
US201615297556 |
申请日期 |
2016.10.19 |
| 申请人 |
Rohm and Haas Electronic Materials LLC |
发明人 |
Kaur Irvinder;Liu Cong;Rowell Kevin;Pohlers Gerhard;Li Mingqi |
| 分类号 |
G03F7/004;C07D213/61;C07D239/26;G03F7/40;G03F7/039;G03F7/16;G03F7/20;G03F7/32;C07C309/06;C07C309/58 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An ionic thermal acid generator, comprising: an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group; and a cation. |
| 地址 |
Marlborough MA US |
