发明名称 Embedded bridge structure in a substrate
摘要 Some novel features pertain to a substrate that includes a first dielectric layer and a bridge structure. The bridge structure is embedded in the first dielectric layer. The bridge structure is configured to provide an electrical connection between a first die and a second die. The first and second dies are configured to be coupled to the substrate. The bridge structure includes a first set of interconnects and a second dielectric layer. The first set of interconnects is embedded in the first dielectric layer. In some implementations, the bridge structure further includes a second set of interconnects. In some implementations, the second dielectric layer is embedded in the first dielectric layer. The some implementations, the first dielectric layer includes the first set of interconnects of the bridge structure, a second set of interconnects in the bridge structure, and a set of pads in the bridge structure.
申请公布号 US9642259(B2) 申请公布日期 2017.05.02
申请号 US201314067677 申请日期 2013.10.30
申请人 QUALCOMM Incorporated 发明人 Kim Chin-Kwan;Bchir Omar James;Kim Dong Wook;We Hong Bok
分类号 H05K7/10;H05K7/12;H05K1/18;H05K1/11;H01L23/538;H01L25/065;H01L23/00 主分类号 H05K7/10
代理机构 Loza & Loza, LLP 代理人 Loza & Loza, LLP
主权项 1. A substrate comprising: a first surface and a second surface, wherein the first surface is located on an opposite side to the second surface; a first dielectric layer adjacent to the second surface; a bridge structure embedded in the first dielectric layer, the bridge structure configured to provide an electrical connection between a first die and a second die, the first and second dies configured to be coupled to the substrate, the bridge structure comprising a first set of interconnects and a second dielectric layer, the first set of interconnects embedded in the first dielectric layer; and a first solder resist layer, wherein the first solder resist layer covers a portion of the first surface of the substrate, and wherein the first solder resist layer comprises a first interconnect configured to couple to the first die and a second interconnect configured to couple to the second die.
地址 San Diego CA US