| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. |
| 申请公布号 |
US2017102621(A1) |
申请公布日期 |
2017.04.13 |
| 申请号 |
US201615385584 |
申请日期 |
2016.12.20 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOF Joeri;BUTLER Hans;DONDERS Sjoerd Nicolaas Lambertus;KOLESNYCHENKO Aleksey Yurievich;LOOPSTRA Erik Roelof;MEIJER Hendricus Johannes Maria;MULKENS Johannes Catherinus Hubertus;RITSEMA Roelof Aeilko Siebranc;VAN SCHAIK Frank;SENGERS Timotheus Franciscus;SIMON Klaus;DE SMIT Joannes Theodoor;STRAAIJER Alexander;STREEFKERK Bob;BIJLAART Erik Theodorus Maria;HOOGENDAM Christiaan Alexander;VAN SANTEN Helmar;VAN DE KERKHOF Marcus Adrianus;KROON Mark;DEN BOEF Arie Jeffrey;OTTENS Joost Jeroen;Maria MERTENS Jeroen Johannes Sophia |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithographic projection apparatus comprising:
a substrate table configured to hold a substrate; a projection system adapted to project a patterned beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid; and a sensor capable of being positioned to be illuminated by a beam of radiation once it has passed through the liquid. |
| 地址 |
Veldhoven NL |
