发明名称 めっきの前処理方法及び記憶媒体
摘要 A pre-treatment method for plating can form a plating layer having sufficient adhesivity on an inner surface of a recess and on a surface of a substrate at an outside of the recess even when the recess has a high aspect ratio. The pre-treatment method for plating includes a preparation process of preparing the substrate having the recess; a first coupling layer forming process of forming a first coupling layer 21a at least on the inner surface of the recess of the substrate by using a first coupling agent; and a second coupling layer forming process of forming a second coupling layer 21b at least on the surface of the substrate at the outside of the recess by using a second coupling agent after the first coupling layer forming process.
申请公布号 JP6100147(B2) 申请公布日期 2017.03.22
申请号 JP20130241090 申请日期 2013.11.21
申请人 東京エレクトロン株式会社 发明人 田 中 崇;稲 富 裕一郎;岩 井 和 俊;岩 下 光 秋
分类号 C23C18/30;C23C18/31;C23C18/32;C23C18/38;G11B5/31;H05K3/18;H05K3/38 主分类号 C23C18/30
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