发明名称 液処理装置
摘要 A liquid processing apparatus of the present disclosure performs a liquid processing by supplying a processing liquid to a substrate that is rotating. A substrate holding unit configured to be rotatable around a vertical axis is provided with a holding surface to attract and hold a bottom surface of the substrate horizontally. A guide unit is formed integrally with the substrate holding unit, disposed around the substrate held in the substrate holding unit, and provided at a position equal to or lower than a height of a top surface of a periphery of the substrate. The guide unit includes a guide surface configured to guide the processing liquid. A rotary cup rotates integrally with the substrate holding unit, and guides the processing liquid towards the cup between the rotary cup and the guide unit.
申请公布号 JP6090113(B2) 申请公布日期 2017.03.08
申请号 JP20130225380 申请日期 2013.10.30
申请人 東京エレクトロン株式会社 发明人 東島 治郎;道木 裕一;飽本 正巳;井上 茂久
分类号 H01L21/304;H01L21/027;H01L21/306 主分类号 H01L21/304
代理机构 代理人
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