发明名称 SEAMLESS INSTRUMENT CLUSTER
摘要 A seamless instrument cluster is provided herein, and a method for providing a seamless instrument cluster as well. The seamless instrument cluster includes an antireflective (AR) film. The AR films may be provided with an airgap disposed between. Also discussed herein is providing an instrument cluster with an applique with a fade pattern. The aspects disclosed herein may be implemented with an instrument cluster employing a neutral density (ND) filter situated between an antiglare surface on a front layer of the applique and a rear layer of an ink.
申请公布号 US2017057356(A1) 申请公布日期 2017.03.02
申请号 US201514837553 申请日期 2015.08.27
申请人 Krier James Frederick;Weindorf Paul Fredrick Luther;Evans Carl Richard 发明人 Krier James Frederick;Weindorf Paul Fredrick Luther;Evans Carl Richard
分类号 B60K35/00;G02B5/20;G02B1/118 主分类号 B60K35/00
代理机构 代理人
主权项 1. An instrument cluster, comprising: a display configured to project light in response to information provided via a digital display renderer; a first antireflective (AR) film or coating applied onto a surface of the display; an applique layer with an aperture to allow the projected light to a viewer of the instrument cluster; and a second AR film applied to a surface of the applique layer that faces the display.
地址 Grosse Pointe Woods MI US