SYSTEMS AND METHODS ENABLING LOW DEFECT PROCESSING VIA CONTROLLED SEPARATION AND DELIVERY OF CHEMICALS DURING ATOMIC LAYER DEPOSITION,申请号SG10201605682Q-传众专利搜索

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发明名称	SYSTEMS AND METHODS ENABLING LOW DEFECT PROCESSING VIA CONTROLLED SEPARATION AND DELIVERY OF CHEMICALS DURING ATOMIC LAYER DEPOSITION
摘要
申请公布号	SG10201605682Q(A)	申请公布日期	2017.02.27
申请号	SG10201605682Q	申请日期	2016.07.12
申请人	LAM RESEARCH CORPORATION	发明人	RAMESH CHANDRASEKHARAN;JENNIFER O'LOUGHLIN;SAANGRUT SANGPLUNG;SHANKAR SWAMINATHAN;FRANK PASQUALE;CHLOE BALDASSERONI;ADRIEN LAVOIE
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