发明名称 |
TUNABLE BARRIER TRANSISTORS FOR HIGH POWER ELECTRONICS |
摘要 |
Various aspects of tunable barrier transistors that can be used in high power electronics are provided. In one example, among others, a tunable barrier transistor includes an inorganic semiconducting layer; a source electrode including a nano-carbon film disposed on the inorganic semiconducting layer; a gate dielectric layer disposed on the nano-carbon film; and a gate electrode disposed on the gate dielectric layer over at least a portion of the nano-carbon film. The nano-carbon film can form a source-channel interface with the inorganic semiconducting layer. A gate field produced by the gate electrode can modulate a barrier height at the source-channel interface. The gate field may also modulate a barrier width at the source-channel interface. |
申请公布号 |
US2017040443(A1) |
申请公布日期 |
2017.02.09 |
申请号 |
US201515305227 |
申请日期 |
2015.04.24 |
申请人 |
University of Florida Research Foundation, Inc. |
发明人 |
LEMAITRE MAX G.;CHEN XIAO;LIU BO;MCCARTHY MITCHELL AUSTIN;RINZLER ANDREW GABRIEL |
分类号 |
H01L29/778;H01L29/51;H01L29/45;H01L29/16 |
主分类号 |
H01L29/778 |
代理机构 |
|
代理人 |
|
主权项 |
1. A tunable barrier transistor, comprising:
an inorganic semiconducting layer; a source electrode comprising a nano-carbon film disposed on a portion of a first side of the inorganic semiconducting layer, the nano-carbon film forming a source-channel interface with the inorganic semiconducting layer; a gate dielectric layer disposed on the nano-carbon film of the source electrode; and a gate electrode disposed on the gate dielectric layer over at least a portion of the nano-carbon film of the source electrode that is disposed on the portion of the first side of the inorganic semiconducting layer, where a gate field produced by the gate electrode modulates a barrier height at the source-channel interface. |
地址 |
Gainesville FL US |