| 发明名称 |
CERAMIC HEATER AND ESC WITH ENHANCED WAFER EDGE PERFORMANCE |
| 摘要 |
Embodiments of the present disclosure provide an improved electrostatic chuck for supporting a substrate. The electrostatic chuck comprises a chuck body coupled to a support stem, the chuck body having a substrate supporting surface, a plurality of tabs projecting from the substrate supporting surface of the chuck body, wherein the tabs are disposed around the circumference of the chuck body, an electrode embedded within the chuck body, the electrode extending radially from a center of the chuck body to a region beyond the plurality of tabs, and an RF power source coupled to the electrode through a first electrical connection. |
| 申请公布号 |
US2017040198(A1) |
申请公布日期 |
2017.02.09 |
| 申请号 |
US201615212695 |
申请日期 |
2016.07.18 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
LIN Xing;ZHOU Jianhua;YE Zheng John;CHEN Jian;ROCHA-ALVAREZ Juan Carlos |
| 分类号 |
H01L21/683;H01L21/67 |
主分类号 |
H01L21/683 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An electrostatic chuck for supporting a substrate, comprising:
a chuck body coupled to a support stem, the chuck body having a substrate supporting surface; a plurality of tabs projecting from the substrate supporting surface of the chuck body, wherein the plurality of tabs are disposed around the circumference of the chuck body; an electrode embedded within the chuck body, the electrode extending radially from a center of the chuck body to a region beyond the plurality of tabs; and an RF power source coupled to the electrode through a first electrical connection. |
| 地址 |
Santa Clara CA US |
