Mask, exposure apparatus and device manufacturing method

摘要

A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.

主权项

1. An exposure apparatus that transfers an image of a pattern of a mask onto a substrate moving in a predetermined direction by a scanning exposure, the exposure apparatus comprising:
a mask driving apparatus that is configured to rotate a mask about a predetermined axis as a rotation axis, the mask having a body with a circular cylinder shape or a circular column shape, the mask having a patterned area and a pair of scale marks for a measurement with an encoder, the patterned area having the pattern and being formed along a circumferential surface of the body, the circumferential surface having a circular cylinder shape that is defined with a constant radius with respect to the predetermined axis, the pair of scale marks being formed along the circumferential surface and arranged at both areas between the patterned area and both axial ends of the circumferential surface, the pair of scale marks being provided substantially all around the circumferential surface and each having a predetermined positional relationship with respect to the patterned area; an illumination apparatus that is configured to provide exposure light onto the circumferential surface of the mask, an illumination area of the exposure light having a substantially rectangular shape that has a longitudinal axis along the predetermined axis; a detection system that is configured to acquire position information relating to the pattern, the detection system having a first encoder system and a second encoder system, the first encoder system being arranged so as to face a first scale mark of the pair of scale marks and to measure a position of the first scale mark in a rotation direction about the predetermined axis, and the second encoder system being arranged so as to face a second scale mark of the pair of scale marks and to measure a position of the second scale mark in a rotation direction about the predetermined axis; and a substrate driving apparatus that moves the substrate at a predetermined speed so that the pattern is continuously exposed in a scanning exposure direction on the substrate, wherein the mask driving apparatus controls the driving of the mask around the predetermined axis when an image of a pattern of the mask is scanning exposed onto the substrate based on position information in the rotation direction acquired by the first encoder system and the second encoder system, and the mask driving apparatus controls a speed of the circumferential surface of the mask which is obtained based on position information in the rotation direction acquired by the first encoder system or the second encoder system and a pitch of the scale marks in a rotation direction so that a speed of the substrate synchronizes with the speed of the circumferential surface of the mask.