发明名称 |
Heavily doped semiconductor nanoparticles |
摘要 |
Herein, provided are heavily doped colloidal semiconductor nanocrystals and a process for introducing an impurity to semiconductor nanoparticles, providing control of band gap, Fermi energy and presence of charge carriers. The method is demonstrated using InAs colloidal nanocrystals, which are initially undoped, and are metal-doped (Cu, Ag, Au) by adding a metal salt solution. |
申请公布号 |
US9543385(B2) |
申请公布日期 |
2017.01.10 |
申请号 |
US201213980348 |
申请日期 |
2012.02.14 |
申请人 |
YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM LTD.;RAMOT AT TEL-AVIV UNIVERSITY LTD. |
发明人 |
Cohen Guy;Millo Oded;Mocatta David;Rabani Eran;Banin Uri |
分类号 |
H01L29/06;H01L21/02;B01J13/00;B82Y10/00;C09K11/62;H01L29/167;H01L29/207;H01L29/227;H01L29/36;C09K11/54;C09K11/61;C09K11/64;C09K11/88;H01L21/22;H01L33/18 |
主分类号 |
H01L29/06 |
代理机构 |
Oliff PLC |
代理人 |
Oliff PLC |
主权项 |
1. A nanoparticle comprising
a semiconductor material, the semiconductor material being doped with at least two atoms of a dopant material, wherein
the at least two atoms of the dopant material are heterovalent to atoms of the semiconductor material, said at least two atoms of the dopant material being dispersed within the semiconductor material, andthe nanoparticle is free of dopant islands within the nanoparticle and free of dopant islands on the surface of the nanoparticle. |
地址 |
Jerusalem IL |