| 摘要 |
A method of laser marking comprises a) irradiating an area (A) of a substrate (S) with energizing radiation generated by an energizing radiation source (Le) to make said irradiated area (A) require less laser energy to be laser marked, and b) irradiating a portion (P) of said area (A) with marking radiation from a marking laser beam (Bm) generated from a marking laser source (Lm) to laser mark said portion (P) of said area (A), wherein the irradiations from the energizing radiation source (Le) and from the marking laser source (Lm) are at least partly overlapping each other in space and time, and are implemented by moving both the energizing radiation and the marking laser beam (Bm) towards various areas (A) of the substrate (S) and portions (P) thereof, respectively, in a synchronized manner. The system is adapted to implement this method. |
