发明名称 |
Positive resist composition and pattern formation method using the positive resist composition |
摘要 |
A positive resist composition comprises: (A) a resin that contains a repeating unit (A1) having a lactone structure and a cyano group, and increases its solubility to an alkali developer by action of an acid; (B) a compound that generates an acid by irradiation with actinic ray or radiation; and (C) a solvent. |
申请公布号 |
EP1783550(B1) |
申请公布日期 |
2016.07.20 |
申请号 |
EP20060023246 |
申请日期 |
2006.11.08 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
IWATO, KAORU;KODAMA, KUNIHIKO |
分类号 |
G03F7/039 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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