Method of detecting an arc occurring during the power supply of a plasma process, control unit for a plasma power supply, and plasma power supply

摘要

A plasma power supply (10) for supplying a plasma process in a plasma chamber(30) with a power comprises:
a. a DC-Source (15);
b. an output signal generator (16) connected to the DC source (15);
c. a first signal sequence measurement device (20) for measuring a signal sequence present between the DC source (15) and the output signal generator (16);
d. a second signal sequence measurement device (18, 19) for measuring a signal sequence present at the output of the output signal generator (16);
f. a control unit (14), which is connected to the first and second signal sequence measurement devices (18, 19, 20).