发明名称 SUBSTRATE TREATING APPARATUS HAVING VORTEX PREVENTION GATE AND THE MANUFACTURING METHOD
摘要 The present invention provides a substrate processing apparatus capable of preventing vortex occurring in a gate for opening and closing an opening of a main body of a chamber, and a manufacturing method thereof. To this end, the substrate processing apparatus of the present invention comprises: a main body of a chamber (100) formed with a cylindrical shape; a gate (200) formed with a curved surface shape to open and close an opening (110) of one side of the main body of the chamber (100); and a gate opening and closing driving unit (300) for moving the gate (200) in a direction perpendicular to an outer surface of the main body of the chamber (100), and providing a driving force to open and close the gate (200) from the opening (110).
申请公布号 KR20160061204(A) 申请公布日期 2016.05.31
申请号 KR20140163803 申请日期 2014.11.21
申请人 STI CO., LTD. 发明人 AHN, HYUN HWAN;SEO, HYUN MO;JUNG, DONG KEUN
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址