发明名称 ELECTRON GUN FOR ELECTRON BEAM EXPOSURE DEVICE
摘要 PURPOSE:To improve brightness and the throughput of an exposure device by accelerating an electron beam from an LaB6 cathode through an anode to which the higher voltage than the required acceleration voltage is applied and decelerating this electron beam through the anode to which required acceleration voltage is applied. CONSTITUTION:A secondary anode 8 is arranged between a first anode 5 and a cathode 1 (and a Wehnelt electrode 4) and a high voltage power supply 9 with the polarity shown in the figure is connected between this anode 8 and the first anode 5. Then the higher acceleration voltage V2 than the voltage V1 of the first anode 5 is applied to the second anode 8 and an electron from an LaB6 cathode 1 is accelerated through the second anode 8 and then this accelerated electron beam is decelerated through the first anode 5. As a result, the brightness of an electron gun is exceedingly increased and the throughput of the electron beam exposure device can be improved.
申请公布号 JPS59196543(A) 申请公布日期 1984.11.07
申请号 JP19830070432 申请日期 1983.04.21
申请人 TOSHIBA KK 发明人 TAKIGAWA TADAHIRO;SASAKI ISAO
分类号 H01J37/06;H01J37/063;H01J37/305;H01L21/027 主分类号 H01J37/06
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