| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device which removes fine particles from a substrate, such as a wafer, without using a chemical solution.SOLUTION: A substrate cleaning device includes: a substrate support part 1 configured to support a substrate W; a vibrator 5 attached to the substrate support part 1; a vibration controller 8 which causes the vibrator 5 to vibrate at a natural frequency of the substrate W; and a cleaning fluid supply nozzle 10 which supplies a cleaning fluid to the substrate W.SELECTED DRAWING: Figure 2 |
