| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus capable of suppressing deterioration of a thin film forming material during its production and capable of obtaining a desired film forming speed.SOLUTION: In an evaporator, a vacuum chamber 401 capable of maintaining an internal atmosphere at a reduced pressure has a material receiving part 511 housing a material supply device 411 therein and including as a discharge port 531 a hole formed in an inner surface of the vacuum chamber 401 and communicating with the inside of an evaporation chamber 441, the material supply device 411 has a material transfer part 541 holding a thin film forming material and supplying the thin film forming material to the material receiving part 511 through a material sending and receiving passage 521, which is a part of the internal atmosphere in the vacuum chamber 401, and the passage cross-sectional area of the material sending and receiving passage 521 is 1/10 or less the cross-sectional area of the inner surface of the vacuum chamber 401.SELECTED DRAWING: Figure 3 |
