BLANKING SYSTEM FOR MULTI CHARGED PARTICLE BEAMS, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

摘要

A blanking system for multi charged particle beams includes a blanking aperture array device to include a first substrate where a plurality of openings corresponding to passage positions of multi-beams are formed in a penetrating manner from the upper surface, and a plurality of electrode groups each having a pair of electrodes which are close to a corresponding one of the plurality of openings and are at opposite sides, on a same surface, of the corresponding one of the plurality of openings are arranged on the first substrate, a second substrate whose lower surface is electrically connected through a bump to the upper surface of the first substrate, and a mounting substrate whose upper surface is electrically connected through a bump to the lower surface of the second substrate.

主权项

1. A blanking system for multi charged particle beams comprising:
a blanking aperture array device configured to include a first substrate where a plurality of openings corresponding to passage positions of multi-beams are formed in a penetrating manner from an upper surface, and a plurality of electrode groups each having a pair of electrodes which are close to a corresponding one of the plurality of openings and are at opposite sides, on a same surface, of the corresponding one of the plurality of openings are arranged on the first substrate; a second substrate whose lower surface is electrically connected through a bump to an upper surface of the first substrate; and a mounting substrate whose upper surface is electrically connected through a bump to a lower surface of the second substrate.