发明名称 THIN FILM TRANSISTOR AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor which achieves high bias stress stability and low density of states due to oxygen defect; and provide a manufacturing method of the thin film transistor.SOLUTION: In a thin film transistor having a laminate composed of a gate insulation layer 4, a metal oxide semiconductor layer 7 containing indium, a buffer layer 8 and a protection layer 9 which is formed by coating a protection layer formation composition which contains polymer including a hydroxyl group in a repeating unit and contains a solvent, the buffer layer 8 is formed to completely cover the metal oxide semiconductor layer 7 and subsequently the protection layer 9 is formed.SELECTED DRAWING: Figure 1
申请公布号 JP2016063053(A) 申请公布日期 2016.04.25
申请号 JP20140189384 申请日期 2014.09.17
申请人 OSAKA PREFECTURE UNIV;NISSAN CHEM IND LTD 发明人 NAITO HIROYOSHI;OKADA JUN;MAEDA SHINICHI
分类号 H01L21/336;H01L21/312;H01L21/368;H01L21/47;H01L29/786 主分类号 H01L21/336
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