发明名称 |
THIN FILM TRANSISTOR AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a thin film transistor which achieves high bias stress stability and low density of states due to oxygen defect; and provide a manufacturing method of the thin film transistor.SOLUTION: In a thin film transistor having a laminate composed of a gate insulation layer 4, a metal oxide semiconductor layer 7 containing indium, a buffer layer 8 and a protection layer 9 which is formed by coating a protection layer formation composition which contains polymer including a hydroxyl group in a repeating unit and contains a solvent, the buffer layer 8 is formed to completely cover the metal oxide semiconductor layer 7 and subsequently the protection layer 9 is formed.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016063053(A) |
申请公布日期 |
2016.04.25 |
申请号 |
JP20140189384 |
申请日期 |
2014.09.17 |
申请人 |
OSAKA PREFECTURE UNIV;NISSAN CHEM IND LTD |
发明人 |
NAITO HIROYOSHI;OKADA JUN;MAEDA SHINICHI |
分类号 |
H01L21/336;H01L21/312;H01L21/368;H01L21/47;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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