发明名称 |
MONOLITHIC GAS DISTRIBUTION MANIFOLD AND VARIOUS CONSTRUCTION TECHNIQUES AND USE CASES THEREFOR |
摘要 |
A gas delivery substrate for mounting gas supply components of a gas delivery system for a semiconductor processing apparatus is provided. The substrate may include a plurality of layers having major surfaces thereof bonded together forming a laminate with openings for receiving and mounting first, second, third and fourth gas supply components on an outer major surface. The substrate may include a first gas channel extending across an interior major surface that at least partially overlaps a second gas channel extending across a different interior major surface. The substrate may include a first gas conduit including the first gas channel connecting the first gas supply component to the second gas supply component, and a second gas conduit including the second channel connecting the third gas supply component to the fourth gas supply component. Also disclosed are various techniques for manufacturing gas delivery substrates. |
申请公布号 |
WO2016061493(A1) |
申请公布日期 |
2016.04.21 |
申请号 |
WO2015US55997 |
申请日期 |
2015.10.16 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
LEE, ANDREW C.;KELLOGG, MICHAEL C.;PENA, CHRISTOPHER J.;DAUGHERTY, JOHN E. |
分类号 |
H01L21/205;H01L21/02 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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