| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of an electronic component that can manufacture electronic components high in characteristic accuracy with a high yield.SOLUTION: A manufacturing method includes a parameter obtaining process for obtaining a parameter of an electronic component element, a photoresist application process, a photoresist exposure process, and a photoresist development process. The parameter obtaining process obtains a parameter for each section set on a wafer W, and the photoresist exposure process corrects a position of at least one of the wafer W and a photomask 305 in a horizontal direction when the parameter for each section varies beyond a predetermined threshold, thus correcting a position of a pattern exposed to the photoresist in a horizontal direction.SELECTED DRAWING: Figure 2 |
