Method of monitoring a manufacturing-process and manufacturing-process monitoring device

摘要

A method of monitoring a manufacturing process includes generating a measurement data by analyzing emission intensity of plasma emission light using a measurement device, the plasma emission light being generated when a plasma gas of a manufacturing process device is changed from an energy level corresponding to a high energy state to an energy level corresponding to a low energy state, generating a compensated value based on the measurement data, the compensated value being generated by offsetting a sensitivity change that is caused due to pollution of the manufacturing process device and the measurement device or measurement locations of the measurement device, and monitoring the manufacturing process based on the compensated value.

主权项

1. A method of monitoring a manufacturing process, the method comprising:
generating a measurement data by analyzing emission intensity of plasma emission light using a measurement device, the plasma emission light being generated when a plasma gas of a manufacturing process device is changed from an energy level corresponding to a high energy state to an energy level corresponding to a low energy state; generating a compensated value based on the measurement data, the compensated value being generated by offsetting a sensitivity change that is caused due to pollution of the manufacturing process device and the measurement device or measurement locations of the measurement device; and monitoring the manufacturing process based on the compensated value, wherein generating the compensated value includes determining the compensated value as a normalized value that is generated by normalizing the emission intensity of the plasma emission light based on an average and a standard deviation of the emission intensity of the plasma emission light in reference to a preset band or a whole band of wavelengths.