| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a metal grid contact and a dielectric pattern in a photovoltaic device.SOLUTION: A method includes the steps of: providing a patterned resist 43, which covers a first portion of a device layer, over the device layer; providing a dielectric layer 42 over the patterned resist 43 and a second portion of the device layer; forming one or more openings in the dielectric layer 42' on the patterned resist 43 and exposing portions of the patterned resist 43; removing the patterned resist 43 through the exposed portions of the patterned resist 43 and removing the dielectric layer 42' on the patterned resist 43 by removing the patterned resist 43 without removing the dielectric layer 42 on the second portion of the device layer.SELECTED DRAWING: Figure 4H |
