| 摘要 |
PROBLEM TO BE SOLVED: To provide substrate processing equipment capable of preferably controlling an order of conveying a substrate from a processing unit to exposure equipment separated from the equipment even when the processing unit has a plurality of conveying routes of the substrate.SOLUTION: Substrate processing equipment 10 comprises: a processing unit 3 vertically provided with substrate processing lines Lu and Ld each for processing a substrate W while conveying the substrate W in an approximately horizontal direction; and an IF unit 5 for conveying the substrate W discharged from each of the substrate processing lines Lu and Ld, to exposure equipment EXP separated from the equipment 10, in which an order (OE) of the substrate W conveyed to the exposure equipment EXP corresponds to an order (OA) of the substrate loaded to the processing unit 3. Accordingly, the substrate processing lines Lu and Ld are vertically provided to improve through-put of the equipment 10 without increasing a footprint, and the order (OE) of the substrate W conveyed to the exposure equipment corresponds to the order (OA) of the substrate W loaded to the processing unit 3 to allow respective substrates W to be easily controlled. |
