Monitoring apparatus and method particularly useful in photolithographically processing substrates

摘要

Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

主权项

1. A monitoring station for use with a patterning tool for monitoring a patterning applied to a substrate, the monitoring station comprising:
a supporting assembly comprising a supporting plate for supporting the substrate; and a measurement device comprising:
an optical unit adapted to illuminate the substrate and collect light from the substrate and generate data indicative of the collected light, said optical unit being accommodated within an enclosure having a transparent window aligned with and facing said supporting plate, thereby enabling collection of light from the substrate, while on the supporting plate, via said transparent window; anda control unit configured to be connectable to the optical unit for receiving and processing said data indicative of the collected light and determining at least one parameter of the substrate indicative of critical dimensions of the patterned layer, the control unit being connectable to a general control unit associated with the processing tool for data exchange.