发明名称 ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an illumination optical apparatus and an exposure apparatus which can contribute to increase in manufacture efficiency of a device with increase in an output of a light source, even when a spatial light modulation member is disposed in an optical path of light emitted from the light source, and a method for manufacturing a device.SOLUTION: An exposure apparatus 11 includes an illumination optical apparatus 13 that guides exposure light EL emitted from an exposure light source 12 to a reticle R. The illumination optical apparatus 13 includes a plurality of movable multimirrors 22 arranged in an array, in which each movable multimirror 22 is composed of a plurality of element mirrors having a movable reflection surface, arranged in an array. Each movable multimirror 22 is disposed in an optical path of the exposure light EL emitted from the light source 12.SELECTED DRAWING: Figure 1
申请公布号 JP2016035593(A) 申请公布日期 2016.03.17
申请号 JP20150223763 申请日期 2015.11.16
申请人 NIKON CORP 发明人 HIROTA HIROYUKI
分类号 G03F7/20;G02B3/00;G02B5/18;G02B7/20;G02B19/00;G02B26/08 主分类号 G03F7/20
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