| 摘要 |
PROBLEM TO BE SOLVED: To provide a susceptor cover capable of reducing a deformation volume of the susceptor cover caused by heating, and not requiring enlargement of washing equipment; and to provide a vapor phase growth apparatus including the susceptor cover.SOLUTION: In a susceptor cover, which is installed revolvably in a chamber, and installed on a susceptor in a vapor phase growth apparatus including the susceptor having a plurality of substrate placing parts where a substrate on which a thin film is to be deposited is placed rotatably, the shape is circular, an opening part 5 is provided continuously in the circumferential direction on a portion corresponding to the substrate placing part, and a plurality of notches 6 extending from the outer peripheral edge to the inside in the radial direction are provided.SELECTED DRAWING: Figure 1 |
