| 发明名称 |
PATTERNING METHOD |
| 摘要 |
A patterning method according to one embodiment includes forming on a glass substrate a guide pattern including a first region at which the glass substrate is exposed, and a second region on which a pattern is formed. A self-assembly material including a first segment pinned to the first region, and a second segment is applied onto the guide pattern. The self-assembly material is phase-separated into a first domain including the first: segment and a second domain including the second segment. One of the first domain and the second domain is selectively removed. The width of the first region is not less than 0.8 times and not more than 1.15 times as large as the width of the first domain. |
| 申请公布号 |
US2016068430(A1) |
申请公布日期 |
2016.03.10 |
| 申请号 |
US201514645017 |
申请日期 |
2015.03.11 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
SUENAGA Machiko;Sakurai Hideaki;Motokawa Takeharu;Terayama Masatoshi |
| 分类号 |
C03C15/00 |
主分类号 |
C03C15/00 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A patterning method comprising:
forming on a glass substrate a guide pattern including a first region at which the glass substrate is exposed, and a second region on which a pattern is formed; applying onto the guide pattern a self-assembly material including a first segment pinned to the first region, and a second segment; phase-separating the self-assembly material into a first domain including the first segment and a second domain including the second segment; and selectively removing one of the first domain and the second domain, wherein the width of the first region is not less than 0.8 times and not more than 1.15 times as large as the width of the first domain. |
| 地址 |
Tokyo JP |
