| 发明名称 |
METHOD FOR FORMING PATTERN ON SURFACE OF INSULATING SUBSTRATE AND CERAMIC ARTICLE |
| 摘要 |
Embodiments of the present disclosure are directed to a method for forming a pattern on a surface of an insulating substrate and/or a ceramic article. The method comprises: forming a film on at least one surface of the insulating substrate, a material of the film comprising at least one of ZnO, SnO2, TiO2, or a combination thereof; and irradiating at least a part of the film by an energy beam to form the pattern in the film. |
| 申请公布号 |
US2016067996(A1) |
申请公布日期 |
2016.03.10 |
| 申请号 |
US201514943808 |
申请日期 |
2015.11.17 |
| 申请人 |
BYD COMPANY LIMITED |
发明人 |
XU Qiang;LIN Xinping |
| 分类号 |
B41M5/26;B41M5/24;C23C14/35 |
主分类号 |
B41M5/26 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for forming a pattern on a surface of an insulating substrate, comprising:
forming a film on at least one surface of the insulating substrate, a composition of the film comprising at least one material selected from ZnO, SnO2, TiO2, or a combination thereof; and irradiating at least a part of the film by an energy beam to form the pattern in the film. |
| 地址 |
Shenzhen CN |
