发明名称 |
Chemical vapor infiltration apparatus and process |
摘要 |
The present invention relates to improvements in chemical vapor infiltration processes and devices for depositing a biocompatible material onto a porous substrate to form an orthopedic implant. The substrate may be formed of reticulated vitreous foam and coated with tantalum, niobium, tungsten, or other biocompatible materials. |
申请公布号 |
US9277998(B2) |
申请公布日期 |
2016.03.08 |
申请号 |
US201514620287 |
申请日期 |
2015.02.12 |
申请人 |
Zimmer, Inc. |
发明人 |
Vargas Joseph R.;Seelman Steven;Roberts David B. |
分类号 |
C23C16/08;A61F2/30;C23C16/44;C23C16/04;C23C16/455;C23C16/458;A61F2/28;B22F3/14 |
主分类号 |
C23C16/08 |
代理机构 |
Schwegman Lundberg & Woessner, P.A. |
代理人 |
Schwegman Lundberg & Woessner, P.A. |
主权项 |
1. A method of operating a chemical vapor infiltration apparatus to produce an orthopedic implant, the method comprising the steps of:
placing a porous substrate in a reaction chamber of the chemical vapor infiltration apparatus, the reaction chamber having a first end and a second end with an exhaust gas outlet located proximate said second end; exposing the porous substrate to a process gas in the reaction chamber as the process gas flows through the reaction chamber in a direction toward the exhaust gas outlet, wherein the process gas carries a biocompatible metal for depositing the biocompatible metal onto the porous substrate in the reaction chamber; and controlling temperature in the reaction chamber during said exposing, wherein said controlling includes creating a temperature profile in the reaction chamber in which temperatures increase in said direction toward the exhaust gas outlet, wherein the chemical vapor infiltration apparatus includes a repositionable heat source positioned around the reaction chamber for providing heat to the reaction chamber during said exposing. |
地址 |
Warsaw IN US |