发明名称 Chemical vapor infiltration apparatus and process
摘要 The present invention relates to improvements in chemical vapor infiltration processes and devices for depositing a biocompatible material onto a porous substrate to form an orthopedic implant. The substrate may be formed of reticulated vitreous foam and coated with tantalum, niobium, tungsten, or other biocompatible materials.
申请公布号 US9277998(B2) 申请公布日期 2016.03.08
申请号 US201514620287 申请日期 2015.02.12
申请人 Zimmer, Inc. 发明人 Vargas Joseph R.;Seelman Steven;Roberts David B.
分类号 C23C16/08;A61F2/30;C23C16/44;C23C16/04;C23C16/455;C23C16/458;A61F2/28;B22F3/14 主分类号 C23C16/08
代理机构 Schwegman Lundberg & Woessner, P.A. 代理人 Schwegman Lundberg & Woessner, P.A.
主权项 1. A method of operating a chemical vapor infiltration apparatus to produce an orthopedic implant, the method comprising the steps of: placing a porous substrate in a reaction chamber of the chemical vapor infiltration apparatus, the reaction chamber having a first end and a second end with an exhaust gas outlet located proximate said second end; exposing the porous substrate to a process gas in the reaction chamber as the process gas flows through the reaction chamber in a direction toward the exhaust gas outlet, wherein the process gas carries a biocompatible metal for depositing the biocompatible metal onto the porous substrate in the reaction chamber; and controlling temperature in the reaction chamber during said exposing, wherein said controlling includes creating a temperature profile in the reaction chamber in which temperatures increase in said direction toward the exhaust gas outlet, wherein the chemical vapor infiltration apparatus includes a repositionable heat source positioned around the reaction chamber for providing heat to the reaction chamber during said exposing.
地址 Warsaw IN US