发明名称 INFRARED RAY PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an infrared ray processing method for applying infrared ray energy while two materials contained in a target are provided with priority levels.SOLUTION: Infrared ray to be applied to a coating film 82 containing first and second materials is made different between a step (a) when the coating film 82 is passed through a first processing space 12a and then a step (b) when the coating film is passed through a second processing space 12a. In the step (a), infrared ray energy is preferentially applied to the first material of the first and second materials in the coating film 82. In the step (b), infrared ray energy is applied to the second material in the coating film 82. Accordingly, the second material can be evaporated in the step (b) after the first material is evaporated to increase the concentration of the second material in the coating film 82 in the step (a).SELECTED DRAWING: Figure 1
申请公布号 JP2016031816(A) 申请公布日期 2016.03.07
申请号 JP20140153186 申请日期 2014.07.28
申请人 NGK INSULATORS LTD 发明人 AOKI MICHIRO;KONDO YOSHIO;FUJITA TAKEKI
分类号 H05B3/10;F26B23/04 主分类号 H05B3/10
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