发明名称 電子ビームの照射方法
摘要 <P>PROBLEM TO BE SOLVED: To provide an electron beam irradiating method in which the local temperature rise of an idle target can be prevented advantageously and furthermore, deformation of the idle target and occurrence of metal vapor can be avoided. <P>SOLUTION: When a separately prepared idle target is irradiated with electron beams for a period until the output of the electron beams are stabilized or for a period until the outside of a metal strip is irradiated with the electron beams in the method that the metal strip is irradiated with the electron beam, a beam irradiation diameter on the idle target surface when the idle target is irradiated with the electron beams is made at least 1.2 times the beam irradiation diameter on the metal strip surface when the metal strip is irradiated with the electron beams. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP5867053(B2) 申请公布日期 2016.02.24
申请号 JP20110273761 申请日期 2011.12.14
申请人 JFEスチール株式会社 发明人 ▲高▼城 重宏;山口 広;大村 健;井上 博貴;岡部 誠司
分类号 B23K15/02;B23K15/00 主分类号 B23K15/02
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