发明名称 POLISHING AGENT, POLISHING METHOD AND ADDITIVE LIQUID FOR POLISHING
摘要 A polishing agent includes a particle of a metal oxide, a water-soluble polyamide, an organic acid and water. The water-soluble polyamide has a tertiary amino group and/or an oxyalkylene chain in a molecule thereof. The polishing agent has a pH of 7 or less.
申请公布号 US2016024351(A1) 申请公布日期 2016.01.28
申请号 US201514808555 申请日期 2015.07.24
申请人 ASAHI GLASS COMPANY, LIMITED 发明人 YOSHIDA Iori;TAKAGI Nobuyuki;SUZUKI Masaru;OTSUKl Toshihiko
分类号 C09G1/04;H01L21/3105;C08L77/00 主分类号 C09G1/04
代理机构 代理人
主权项 1. A polishing agent, comprising a particle of a metal oxide, a water-soluble polyamide having a tertiary amino group and/or an oxyalkylene chain in a molecule thereof, an organic acid and water, and having a pH of 7 or less.
地址 Chiyoda-ku JP