发明名称 |
POLISHING AGENT, POLISHING METHOD AND ADDITIVE LIQUID FOR POLISHING |
摘要 |
A polishing agent includes a particle of a metal oxide, a water-soluble polyamide, an organic acid and water. The water-soluble polyamide has a tertiary amino group and/or an oxyalkylene chain in a molecule thereof. The polishing agent has a pH of 7 or less. |
申请公布号 |
US2016024351(A1) |
申请公布日期 |
2016.01.28 |
申请号 |
US201514808555 |
申请日期 |
2015.07.24 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
YOSHIDA Iori;TAKAGI Nobuyuki;SUZUKI Masaru;OTSUKl Toshihiko |
分类号 |
C09G1/04;H01L21/3105;C08L77/00 |
主分类号 |
C09G1/04 |
代理机构 |
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代理人 |
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主权项 |
1. A polishing agent, comprising a particle of a metal oxide, a water-soluble polyamide having a tertiary amino group and/or an oxyalkylene chain in a molecule thereof, an organic acid and water, and having a pH of 7 or less. |
地址 |
Chiyoda-ku JP |