发明名称 Wafer mapping apparatus and load port including same
摘要 The left-right span between a light projection section 5a and a light receiving section 5b of a mapping sensor 5 having an optical axis L1 extending in a left-right horizontal direction is arranged to be narrower than the span of a front opening of a open cassette 12 which is a smaller one of differently-sized containers conveyed to a load port, and the mapping sensor is attached to a mapping device 4. A first protrusion sensor 6 having an optical axis L2 extending in the left-right horizontal direction is attached to the mapping device 4 to be separated from the mapping sensor 5 in a moving direction of the mapping sensor 5. Furthermore, a second protrusion sensor 7 having an optical axis extending in the up-down moving direction of the mapping sensor 5 is provided.
申请公布号 US9239228(B2) 申请公布日期 2016.01.19
申请号 US201514689551 申请日期 2015.04.17
申请人 SINFONIA TECHNOLOGY CO., LTD. 发明人 Natsume Mitsuo;Osawa Masahiro;Morihana Toshimitsu;Ochiai Mitsutoshi
分类号 G01N21/64;G01B11/14;G01B11/24;G01B11/00;G01N35/10;G01B11/22 主分类号 G01N21/64
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A wafer mapping apparatus for commonly mapping differently-sized wafers which are conveyed to a load port and stored in differently-sized containers, the wafer mapping apparatus comprising: a mapping sensor which emits a detection wave having a radiation axis extending in a left-right horizontal direction, a left-right span of the mapping sensor being narrower than a span of a front opening of a minimum-sized container among the differently-sized containers, and the mapping sensor being inserted into a front opening of each of the containers and moving in an up-down direction in each of the containers to detect the wafers stored in each of the containers; a mapping device which is movable in the up-down direction, the mapping sensor being attached to the mapping device; a first protrusion sensor which emits a detection wave having a radiation axis extending in the left-right horizontal direction, and is attached to the mapping device to be separated frontward from the mapping sensor in a moving direction of the mapping sensor so as to detect a protrusion of a wafer stored in each of the containers; and a second protrusion sensor which emits a detection wave having a radiation axis extending in an up-down moving direction of the mapping sensor, and detects a protrusion of a wafer stored in each of the containers.
地址 Minato-ku JP