发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device equipped with an oxide semiconductor film having conductivity, and also to provide a method of manufacturing the semiconductor device which has light transmissivity and is equipped with the oxide semiconductor film having conductivity.SOLUTION: Disclosed is a method of manufacturing a semiconductor device in which an oxide semiconductor film is formed on a first insulation film, and the oxide semiconductor film having conductivity is formed by performing a second heating treatment in an atmosphere including hydrogen after performing a first heating treatment in the atmosphere in which oxygen contained in the oxide semiconductor film is desorbed therefrom.
申请公布号 JP2016001712(A) 申请公布日期 2016.01.07
申请号 JP20140235720 申请日期 2014.11.20
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 OTA MASASHI;ISHIHARA NORITAKA;NAKAJIMA MOTOI;KUROSAWA YOICHI;YAMAZAKI SHUNPEI;HOSAKA HIROYASU;UBUNAI TOSHIMITSU;HIZUKA JUNICHI
分类号 H01L21/28;G09F9/30;H01L21/02;H01L21/477;H01L21/822;H01L27/04;H01L29/786;H01L51/50;H05B33/08;H05B33/10 主分类号 H01L21/28
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