发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device equipped with an oxide semiconductor film having conductivity, and also to provide a method of manufacturing the semiconductor device which has light transmissivity and is equipped with the oxide semiconductor film having conductivity.SOLUTION: Disclosed is a method of manufacturing a semiconductor device in which an oxide semiconductor film is formed on a first insulation film, and the oxide semiconductor film having conductivity is formed by performing a second heating treatment in an atmosphere including hydrogen after performing a first heating treatment in the atmosphere in which oxygen contained in the oxide semiconductor film is desorbed therefrom. |
申请公布号 |
JP2016001712(A) |
申请公布日期 |
2016.01.07 |
申请号 |
JP20140235720 |
申请日期 |
2014.11.20 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
OTA MASASHI;ISHIHARA NORITAKA;NAKAJIMA MOTOI;KUROSAWA YOICHI;YAMAZAKI SHUNPEI;HOSAKA HIROYASU;UBUNAI TOSHIMITSU;HIZUKA JUNICHI |
分类号 |
H01L21/28;G09F9/30;H01L21/02;H01L21/477;H01L21/822;H01L27/04;H01L29/786;H01L51/50;H05B33/08;H05B33/10 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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