发明名称 CIGS FILM PRODUCTION METHOD, AND CIGS SOLAR CELL PRODUCTION METHOD USING THE CIGS FILM PRODUCTION METHOD
摘要 The CIGS film production method includes: a stacking step of stacking a layer (A) containing indium, gallium and selenium and a layer (B) containing copper and selenium, in this order in a solid phase over a substrate; and a heating step of heating the resulting stack of the layer (A) and the layer (B) to melt the layer (B) into a liquid phase, whereby copper is diffused from the layer (B) into the layer (A) to cause crystal growth; wherein the layer (A) is formed by repeatedly stacking a gallium selenide film (Y) and an indium selenide film (X) in this order and reducing a thickness ratio (Y/X) between the gallium selenide film (Y) and the indium selenide film (X) as the stacking is repeated.
申请公布号 US2015380596(A1) 申请公布日期 2015.12.31
申请号 US201414766565 申请日期 2014.01.24
申请人 NITTO DENKO CORPORATION 发明人 Nishii Hiroto;Watanabe Taichi;Yamamoto Yusuke;Teraji Seiki;Kawamura Kazunori
分类号 H01L31/18;H01L31/0392 主分类号 H01L31/18
代理机构 代理人
主权项 1. A CIGS film production method comprising the steps of: stacking a layer (A) containing indium, gallium and selenium and a layer (B) containing copper and selenium, in this order in a solid phase over a substrate; and heating a resulting stack of the layer (A) and the layer (B) to melt the layer (B) into a liquid phase, whereby copper is diffused from the layer (B) into the layer (A) to cause crystal growth; wherein the layer (A) is formed by repeatedly stacking a gallium selenide film (Y) and an indium selenide film (X) in this order and reducing a thickness ratio (Y/X) between the gallium selenide film (Y) and the indium selenide film (X) as the stacking is repeated.
地址 Ibaraki-shi, Osaka JP