发明名称 ION INJECTION DEVICE AND ION INJECTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide an ion injection device and an ion injection method that can be used in a wide range.SOLUTION: An ion injection device 300 comprises a beam scanning part 306 and a beam parallelizing part 308 disposed downstream of the beam scanning part 306. The beam scanning part 306 has a scanning origin point on the central axis of an incident ion beam and in the central part of the beam scanning part 306. The beam parallelizing part 308 has a focal point at the scanning origin point as a parallelizing lens. The ion injection device 300 is configured such that the focal point of an ion beam made incident on the beam scanning part 306 is located further upstream than the scanning origin point along the central axis of the incident ion beam. The focal point of an ion beam made incident on the beam scanning part 306 is adjusted along the central axis of the incident ion beam and further upstream than the scanning origin point, so as to correct a divergence phenomenon resulting from a space charge effect by an ion beam emitted from the beam parallelizing part 308.
申请公布号 JP2015232947(A) 申请公布日期 2015.12.24
申请号 JP20140118901 申请日期 2014.06.09
申请人 SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO LTD 发明人 YAKIDA TAKANORI;KABASAWA MITSUAKI
分类号 H01J37/317;H01L21/265 主分类号 H01J37/317
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