| 摘要 |
A radiation-sensitive or active-ray-light-sensitive resin composition contains a polymer compound (A) having a structural site (a) that is decomposed by irradiation of active light rays or radiation and generates an acid anion on a side chain, and a repeating unit (b) expressed in general formula (I). In the formula, R3 represents a hydrogen atom, an organic group, or a halogen atom. A1 represents an aromatic ring group or an alicyclic group. R1 and R2 each individually represent an alkyl group, a cycloalkyl group, or an aryl group. At least two of A1, R1, and R2 may be bonded together to form a ring. B1 and L1 each individually represent a single bond or a divalent linking group. X represents a hydrogen atom or an organic group. n represents an integer of 1 or greater. When n represents an integer of 2 or more, the multiple instances of L1, the multiple instances of R1, the multiple instances of R2, and the multiple instances of X may be the same as, or different from, each other. |
