发明名称 MEMORY CELLS WITH RECESSED ELECTRODE CONTACTS
摘要 Memory cells with recessed electrode contacts and methods of forming the same are provided. An example memory cell can include an electrode contact formed in a substrate. An upper surface of the electrode contact is recessed a distance relative to an upper surface of the substrate. A first portion of a memory element is formed on an upper surface of the electrode contact and the upper surface of the substrate.
申请公布号 US2015364683(A1) 申请公布日期 2015.12.17
申请号 US201514833423 申请日期 2015.08.24
申请人 Micron Technology, Inc. 发明人 Sills Scott E.;Ramaswamy D.V. Nirmal
分类号 H01L45/00 主分类号 H01L45/00
代理机构 代理人
主权项
地址 Boise ID US