发明名称 PLASMA PROCESSING APPARATUS
摘要 The present invention relates to a plasma processing apparatus. The plasma processing apparatus includes a reaction part which performs a plasma process on an object in a vacuum state, and a jig transfer part which includes a jig having a tray on which the object is placed, a horizontal transfer part which horizontally move the jig to move the tray to the reaction part, and a vertical transfer part which is separated from the horizontal part and vertically moves the jig to vertically move the tray which has been moved to the reaction part.
申请公布号 KR101578552(B1) 申请公布日期 2015.12.17
申请号 KR20140113479 申请日期 2014.08.28
申请人 SETS 发明人 PARK, JUNG SU;KIM, MIN JAE;CHOI, DAI YEOUL;SEO, GWANG WON
分类号 H01L21/02;H01L21/205;H01L21/3065;H01L21/677;H05H1/46 主分类号 H01L21/02
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