发明名称 ETCHING PROCESSING METHOD
摘要 An etching processing method capable of extending lifetime of desmear liquid is provided to control an etching rate by adding a reaction accelerator or a reaction inhibitor to a desmear liquid. A desmear liquid is prepared, and includes alkaline permanganate etching solution. A resin member is dipped in the desmear liquid. An etching rate of the desmear liquid is controlled by one among a reaction accelerator and a reaction inhibitor. The reaction accelerator accelerates the etching rate of the desmear liquid. The reaction inhibitor suppresses the etching rate of the desmear liquid. The reaction accelerator is Na2CO5. The reaction inhibitor is Ca(OH)2.
申请公布号 KR20090023131(A) 申请公布日期 2009.03.04
申请号 KR20080081787 申请日期 2008.08.21
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 NAKAMURA NORIKAZU
分类号 H05K3/26;H05K3/18;H05K3/38 主分类号 H05K3/26
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