| 摘要 |
<P>PROBLEM TO BE SOLVED: To give a functional group to the surface of a pattern organizer, and to provide a manufacturing method for the pattern organizer that does not require any post treatment or the like after exposure to light. <P>SOLUTION: The manufacturing method for a pattern organizer has a substrate preparation process for the pattern organizer for preparing a substrate for the pattern organizer having a characteristic change layer made of a macromolecular material, and a pattern formation process for giving a functional group in a pattern to the surface of a characteristic change layer made of the macromolecular material, by applying energy from a specific direction after arranging a layer containing photo catalyst on a substrate at the side of a layer for containing photo catalyst having the layer for containing photo catalyst and the substrate, and the characteristic change layer at an interval of 200 μm or less. <P>COPYRIGHT: (C)2003,JPO |
