发明名称 |
ANALYSIS DEVICE, PROGRAM, DEFECT INSPECTION DEVICE, REVIEW DEVICE, ANALYSIS SYSTEM, AND ANALYSIS METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a technology capable of easily specifying an inspection recipe that can efficiently detect a defect desired to be detected. SOLUTION: A defect inspection device 110 performs a defect inspection of one substrate with a plurality of inspection recipes; produces defect information that a defect position in a substrate, and a feature quantity of the defect are corresponded for each inspection recipe. A review device 120 produces, with regard to defects selected from defects contained in the defect information, review result information that specifies the type of the defect selected. An analysis device 130 acquires the defect information and the review result information, and aggregates the number of defects having a feature quantity similar to the feature quantity that the defect corresponding to the type of the defect to be analyzed. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008224638(A) |
申请公布日期 |
2008.09.25 |
申请号 |
JP20070067849 |
申请日期 |
2007.03.16 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
ONO MAKOTO;KONISHI JIYUNKO;FUNAKOSHI TOMOHIRO |
分类号 |
G01N21/956;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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地址 |
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